Achemetal Tungsten & Molybdenum Co., Ltd.
Subtlety and perseverance
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Product description
Metal Organic Chemical Vapor Deposition (MOCVD)
Metal organic chemical vapor deposition (MOCVD for short) is a main method for thin-layer single crystals of technical growth III-V group & II-VI group compounds and alloy. Introduce hydrogen or nitrogen serving as carrier gas into liquid to carry vapor out, mix the compound with V group hydrides (such as NH3, PH3, AsH3), introduce the mixture into a reaction room to react on the heated substrate surface, and externally extend to grow compound crystal films.
The shining core of LED is a composite material called “Epitaxial Slice”. Due to successful application of MOCVD technology in epitaxial slices, the using amount of this kind of equipment can be increased rapidly.
The operating temperature of MOCVD equipment during operation is higher than 2,000℃, so tungsten-molybdenum is the preferred material for partial components of the equipment.
Product Specification
Chemical requirements
| Element | Ni | Mg | Fe | Pb | Al | Bi | Si | Cd | Ca | P |
| Concentration(%) | 0.003 | 0.002 | 0.005 | 0.0001 | 0.002 | 0.0001 | 0.002 | 0.0001 | 0.002 | 0.001 |
| Element | C | O | N | Sb | Sn | Mo | ||||
| Concentration(%) | 0.01 | 0.003 | 0.003 | 0.0005 | 0.0001 | balance | ||||
Product detail
Organic Chemical Vapor Deposition Systems
Feature
Excellent conductivity of electricity
Resistance of high temperature
High melting point, high oxidation and erosion resistance.