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Tungsten parts for ion implantation equipmentrom china manufacturer
product description
Ion implantation is a kind of material surface modification high technology which has been flourishing and widely used internationally in the past three decades, realizing the optimization of surface properties of materials or can obtain some new excellent properties. Due to the unique and outstanding characteristics of this high technology, it is a very important technology in modern integrated circuit manufacturing. It uses ion implantation machine to realize the doping of semiconductor and change the conductivity and transistor structure of semiconductor.
Since the conversion of the ion source to plasma ions during ion injection generates an operating temperature of over 2000°C, the ion beam eruption also generates a large amount of ion kinetic energy, and typical metals quickly burn and melt. Therefore, inert metals of relatively high mass and density are required to maintain the direction of ion beam ejection and increase component durability. The high-temperature chemical stability, low thermal degeneration and long service life of tungsten materials have made them the preferred choice for ion source parts and consumables for ion implanters in the semiconductor industry. The shielding barrel of the emitting cathode, the emitting panel, the center fixing rod, the filament pole plate inside the arc starting chamber, etc. These are collectively known as ion implantation tungsten parts.
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